Designing with Tension: Nearly-Developable Patch Layouts

1ETH Zurich, 2University of Technology Sydney
SIGGRAPH Asia 2025 Conference Papers

Abstract

We propose a novel method to automatically approximate a free-form surface using a set of near developable patches that form a tensile-like structure when anchored at a sparse set of points. These structures are appealing for their ability to span large areas with low material cost and structural weight, while also offering strong aesthetic potential. Our algorithm strikes a balance between approximation accuracy, patch simplicity, and visual quality, while ensuring manufacturability and structural feasibility. The layout is guided by a curvature field and refined through a combinatorial process that incrementally adds patches until performance and fabrication constraints are met. Redundant elements are then removed to improve clarity and elegance. We demonstrate the effectiveness of our method on several architectural surfaces, supported by fabricated prototypes that showcase the interplay between geometric design, structural behavior, and visual appeal.

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Acknowledgments

The authors thank the anonymous reviewers for their feedback and gratefully appreciate the assistance and valuable expertise of Helga Bargehr and Brigitte Eggler-Bargehr in sewing during sample fabrication. The authors also thank Fabio Grammazio, Matthias Kohler, and Sarah Schneider for their initial discussions.